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(2006) 'Atomic physics of highly charged ions and the case for Sn as a source material' In: Vivek Bakshi (eds). EUV Sources for Lithography. USA: SPIE.
Meanwhile Vivek Bakshi, country manager at Wipro Romania, believes that Romania and Poland complement each other. “While Poland is better in German and Russian language skills ...
in “EUV Sources for Lithography” editor Vivek Bakshi, Publ. SPIE (2006) [ J Appl Phys] “ Tin based plasmas as EUV sources for 13.5 nm lithography: a statistical ...
EUV sources for lithography / ed. Vivek Bakshi Bellingham : SPIE, 2006 39 988 F 4.3 GEARY, Joseph M. : Introduction to wavefront sensors Bellingham : SPIE - The International Society ...
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