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... Joubert (CEA, France) 09:00 - 09:15 5.2 - Characterization of Low-k Dielectric Etch Residue on the Sidewall by Chemical Force Microscope Tae-Gon Kim , Quoc Toan Le, Samuel Suhard ...
[My paper] Caroline Pradère, Samuel Suhard, Laure Vendier, Guy Jacob, Bruno Chaudret, Sylviane Sabo-Etienne
... late news BEOL 16:39 - 16:42 P4.1 - TiN Metal Hardmask Etch Residues Removal on Advanced Porous Low-k and Cu Device with Corner Rounding Scheme Hua Cui 1 , Martine Claes 2, Samuel Suhard 2 ...
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CNRS LCC (Chemicals industry): Ingenieur de Recherche, (February 2006-November 2008)
university of leicester (Chemicals industry): postdoc, (2005-2006...