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... in Bosh Process And Drie Marc Segers NANOPLAS, France P5.3 - Cleaning requirement in the thinning module for 3D-Stacked IC (3D-SIC) integration Kurt Wostyn , Ming Zhao, Hushan Cui ...
... Process And Drie Marc Segers NANOPLAS, France 17:09 - 17:12 P5.3 - Cleaning requirement in the thinning module for 3D-Stacked IC (3D-SIC) integration Kurt Wostyn , Ming Zhao, Hushan Cui ...
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SEZ (Public Company; Semiconductors industry): Process engineer in wet clean/etch, (March 2007-June 2008)
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